Certificate in Patterning for Semiconductor Devices
-- ViewingNowThe Certificate in Patterning for Semiconductor Devices course is a comprehensive program designed to equip learners with the essential skills necessary for success in the semiconductor industry. This course focuses on the critical area of patterning, which is a key enabler of Moore's Law and the development of advanced semiconductor devices.
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โข Introduction to Patterning for Semiconductor Devices: Basics of semiconductor device patterning, lithography techniques, and their importance. โข Lithography Fundamentals: Photolithography, EUV (Extreme Ultraviolet) lithography, and their applications in semiconductor device manufacturing. โข Resist Technologies: Positive and negative resists, deep ultraviolet (DUV) resists, chemically amplified resists, and their properties. โข Patterning Processes: Lithography process steps, alignment, exposure, development, and etching techniques. โข Multipatterning Techniques: Double/multiple patterning, quadruple patterning, and their advantages and challenges. โข Patterning for 3D Structures: 3D NAND flash and FinFET patterning, 3D-Gate-All-Around (GAA) technology, and via reveal processes. โข Patterning Quality Control: Critical dimension (CD) measurement, overlay metrology, defect inspection, and yield enhancement. โข Patterning for Advanced Node Technologies: EUV lithography for 7nm and below technology nodes, self-aligned quadruple patterning (SAQP), and directed self-assembly (DSA). โข Emerging Patterning Technologies: Nanoimprint lithography (NIL), directed self-assembly (DSA), and other next-generation patterning techniques.
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